Azərbaycan Milli Elmlər Akademiyası
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Qeyd: Əgər DOI məlumdursa, "?????" hissəsini müvafiq DOI ilə əvəz edin. Əgər məlum deyilsə, həmin hissəni silin.

APA: TAGIYEV, D.. (2021). Negative photoresists on the basis of copolymers of 2-chloromethyl-1-(p-vinyl phenyl) cyclopropane with glycidyl methacrylate. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications, 141. doi: ?????
AMA: [1]TAGIYEV D. Negative photoresists on the basis of copolymers of 2-chloromethyl-1-(p-vinyl phenyl) cyclopropane with glycidyl methacrylate. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications. 2021:141. doi:?????
Chicago: TAGIYEV, DB. ‘Negative Photoresists on the Basis of Copolymers of 2-chloromethyl-1-(p-vinyl Phenyl) Cyclopropane with Glycidyl Methacrylate’. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications (17 November 2021): 141. Accesseddoi:?????.
IEEE: [1]D. TAGIYEV, “Negative photoresists on the basis of copolymers of 2-chloromethyl-1-(p-vinyl phenyl) cyclopropane with glycidyl methacrylate”, Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications, p. 141, Nov. 2021, doi: ?????. Available: https://books.google.com/books?hl=en&lr=&id=bi1AEAAAQBAJ&oi=fnd&pg=PA141&dq=info:_eQvQzcau1oJ:scholar.google.com&ots=Iw4rmfZ1YN&sig=jLBCDaPnWGJsLlRWT052c2ckV4E
ISNAD: TAGIYEV, DB. “Negative Photoresists on the Basis of Copolymers of 2-chloromethyl-1-(p-vinyl Phenyl) Cyclopropane with Glycidyl Methacrylate”. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications (November 17, 2021): 141. https://doi.org/?????.
Elsevier: [1]TAGIYEV D. Negative photoresists on the basis of copolymers of 2-chloromethyl-1-(p-vinyl phenyl) cyclopropane with glycidyl methacrylate. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications 2021:141. https://doi.org/?????.
MLA: TAGIYEV, D.. “Negative Photoresists on the Basis of Copolymers of 2-chloromethyl-1-(p-vinyl Phenyl) Cyclopropane with Glycidyl Methacrylate”. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications, Nov. 2021, p. 141, https://doi.org/?????.
Vancouver: 1.TAGIYEV D. Negative photoresists on the basis of copolymers of 2-chloromethyl-1-(p-vinyl phenyl) cyclopropane with glycidyl methacrylate. Advanced Materials, Polymers, and Composites: New Research on Properties, Techniques, and Applications [Internet]. 2021Nov17;:141. Available from: https://books.google.com/books?hl=en&lr=&id=bi1AEAAAQBAJ&oi=fnd&pg=PA141&dq=info:_eQvQzcau1oJ:scholar.google.com&ots=Iw4rmfZ1YN&sig=jLBCDaPnWGJsLlRWT052c2ckV4E