Azərbaycan Milli Elmlər Akademiyası
İnsan resursları və elmmetrik məlumatlar bazası
İnsan resursları və elmmetrik məlumatlar bazası
İstinad formatları:
Qeyd: Əgər DOI məlumdursa, "?????" hissəsini müvafiq DOI ilə əvəz edin. Əgər məlum deyilsə, həmin hissəni silin.
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APA: Tagiyev, D., Gurbanova, U., Safaraliyeva, Z., Abishova, N., & Huseynova, R.. (2021). MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS. Azerbaijan Chemical Journal, (3), 6–11. doi: ?????
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AMA: [1]Tagiyev D, Gurbanova U, Safaraliyeva Z, Abishova N, Huseynova R. MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS. Azerbaijan Chemical Journal. 2021;(3):6-11. doi:?????
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Chicago: Tagiyev, DB, UM Gurbanova, ZS Safaraliyeva, NR Abishova, and RG Huseynova. ‘MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS’. Azerbaijan Chemical Journal no. 3 (1 January 2021): 6–11. Accesseddoi:?????.
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IEEE: [1]D. Tagiyev, U. Gurbanova, Z. Safaraliyeva, N. Abishovaand R. Huseynova, “MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS”, Azerbaijan Chemical Journal, no. 3, pp. 6–11, Jan. 2021, doi: ?????. Available: https://cyberleninka.ru/article/n/mathematical-modeling-the-electrochemical-deposition-process-of-ni-mo-thin-films
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ISNAD: Tagiyev, DB - Gurbanova, UM - Safaraliyeva, ZS - Abishova, NR - Huseynova, RG. “MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS”. Azerbaijan Chemical Journal 3 (January 1, 2021): 6–11. https://doi.org/?????.
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Elsevier: [1]Tagiyev D, Gurbanova U, Safaraliyeva Z, Abishova N, Huseynova R. MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS. Azerbaijan Chemical Journal 2021:6–11. https://doi.org/?????.
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MLA: Tagiyev, D., et al.. “MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS”. Azerbaijan Chemical Journal, no. 3, Jan. 2021, pp. 6–1, https://doi.org/?????.
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Vancouver: 1.Tagiyev D, Gurbanova U, Safaraliyeva Z, Abishova N, Huseynova R. MATHEMATICAL MODELING THE ELECTROCHEMICAL DEPOSITION PROCESS OF Ni–Mo THIN FILMS. Azerbaijan Chemical Journal [Internet]. 2021Jan1;(3):6–11. Available from: https://cyberleninka.ru/article/n/mathematical-modeling-the-electrochemical-deposition-process-of-ni-mo-thin-films